Unstress - Deep Moisturzing Mask

Mascarilla de hidratación profunda que aporta gran cantidad de nutrientes para facilitar la formación de los rizos naturales mas saludables y definidos.

Ingredientes: Water, Cetearyl alcohol, Caprilic capric triglyceride, PEG/PPG-20/20 Phenylisopropyl Caprylyl Dimethicone, Cetrimonium chloride, Bentrimonium chloride, Cetearyl Alcohol and Behentrimonium Methosulfate, Melaleuca Alternifolia Leaf Oil, Butyrospermum parkii (Shea Butter), Orbignya oleifera (Babassu) seed oil, Hidrolyzed Keratin, Hidrolyzed Collagen, Tocopherol, Fragrance (Alpha isomethyl ionone, Benzyl salicylate, Butylphenyl methylpropional, Citronellol, d-Limonene, Hexyl cinnamal, Linalool), Lactic acid, Phenoxyethanol (and) Ethylhexylglycerin, EDTA